Author: Wang Xiaoming, Common Technology Department, Senstren
To further promote simulation technology exchange and deepen cross-enterprise technical cooperation, Senstren and Dun’an Environment jointly held a special seminar themed “Simulation Collaborative Innovation: Co-Research, Co-Share, Co-Progress” on December 26. Through technical exchanges and case sharing, the two sides explored the in-depth application of simulation technology in corporate R&D.
Both parties agreed to continue deepening technical cooperation in the future, striving to upgrade the current collaborative innovation model to simulation-driven innovation, strengthen the leading role of simulation technology in the early stage of R&D, and provide customers with more efficient and reliable solutions.
The seminar focused on the innovative application of simulation technology in product development, process optimization, system integration, cost reduction and efficiency improvement, demonstrating its remarkable effects in enhancing product reliability and shortening R&D cycles.
Centered on the goal of
“creating multi-dimensional value for customers”, both sides shared cases and presented the three major values brought by simulation technology:
improved product performance and reliability, shorter R&D cycles and lower costs, and stronger market competitiveness.
At the end of the meeting, Senstren and Dun’an Environment reached consensus on establishing an annual exchange mechanism and building a shared simulation knowledge base.
The two sides will hold regular technical exchange activities, share simulation technology resources, and jointly promote the application of simulation technology in more fields.
Taking this meeting as a new starting point, the Common Technology Departments of both parties will continue to promote regular exchanges and project-based cooperation, build a closer collaborative innovation community, and jointly inject stronger impetus into the independent R&D and technological innovation of Dia, Senstren and Dun’an Environment.
